説明
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041構成
構成なしOEMモデルの説明
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
検証済み
カテゴリ
High Current
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
54324
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2022
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
検証済み
カテゴリ
High Current
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
54324
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2022
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041構成
構成なしOEMモデルの説明
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.ドキュメント
ドキュメントなし