説明
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.構成
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEMモデルの説明
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).ドキュメント
ドキュメントなし
IBS
TM200S
カテゴリ
Ion Beam / IBD
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
17433
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.構成
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEMモデルの説明
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).ドキュメント
ドキュメントなし