説明
説明なし構成
構成なしOEMモデルの説明
The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.ドキュメント
ドキュメントなし
HEIDELBERG INSTRUMENTS
DWL 66
検証済み
カテゴリ
Lithography
最終検証: 20日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
79918
ウェーハサイズ:
不明
ヴィンテージ:
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66
カテゴリ
Lithography
最終検証: 20日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
79918
ウェーハサイズ:
不明
ヴィンテージ:
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.ドキュメント
ドキュメントなし