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HITACHI HL-7000M
    説明
    6" RETICLE MASK LINE
    構成
    構成なし
    OEMモデルの説明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    ドキュメント

    ドキュメントなし

    HITACHI

    HL-7000M

    verified-listing-icon

    検証済み

    カテゴリ

    Lithography
    最終検証: 30日前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    101772


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

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    同様のリスト
    すべて表示
    HITACHI HL-7000M
    HITACHIHL-7000MLithography
    ヴィンテージ: 0状態: 中古
    最終確認30日前

    HITACHI

    HL-7000M

    verified-listing-icon

    検証済み

    カテゴリ

    Lithography
    最終検証: 30日前
    listing-photo-4910996d204141df9ad532d6e0f6f1b9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    101772


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    6" RETICLE MASK LINE
    構成
    構成なし
    OEMモデルの説明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithographyヴィンテージ: 0状態: 中古最終検証: 30日前
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithographyヴィンテージ: 0状態: 中古最終検証: 60日以上前