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SEN CORPORATION / SUMITOMO NV MC3
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Medium Current

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    119327


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    SEN CORPORATION / SUMITOMO NV MC3

    SEN CORPORATION / SUMITOMO

    NV MC3

    Medium Current
    ヴィンテージ: 2001状態: 中古
    最終確認60日以上前

    SEN CORPORATION / SUMITOMO

    NV MC3

    verified-listing-icon
    検証済み
    カテゴリ
    Medium Current
    最終検証: 60日以上前
    listing-photo-a0d98fd93f3b4c808fbffc3d4be2021b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    119327


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    SEN CORPORATION / SUMITOMO NV MC3

    SEN CORPORATION / SUMITOMO

    NV MC3

    Medium Currentヴィンテージ: 2001状態: 中古最終検証:60日以上前