説明
implanter構成
Dosage range (actual dose: 10¹⁰～10¹⁴ ions/cm²), beam current (～500μA). * Throughput: ≥100 ions/h (6in)OEMモデルの説明
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.ドキュメント
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ULVAC
SOPHI-200
カテゴリ
Medium Current
最終検証： 10日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
139233
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
implanter構成
Dosage range (actual dose: 10¹⁰～10¹⁴ ions/cm²), beam current (～500μA). * Throughput: ≥100 ions/h (6in)OEMモデルの説明
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.ドキュメント
ドキュメントなし