説明
High Current Implanter 1 Chamber Damage/Missing parts list: Pumps, chillers, and support items may not be included, please inspect the tool to confirm.構成
構成なしOEMモデルの説明
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.ドキュメント
ドキュメントなし
カテゴリ
Medium Current
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147596
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
カテゴリ
Medium Current
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147596
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
High Current Implanter 1 Chamber Damage/Missing parts list: Pumps, chillers, and support items may not be included, please inspect the tool to confirm.構成
構成なしOEMモデルの説明
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.ドキュメント
ドキュメントなし