説明
MED CURRENT IMPLANTER - HP構成
構成なしOEMモデルの説明
The VIISta 810 HP provides precise total incident angle and dosimetry control to enable tighter distribution of electrical device parameters and a 50% reduction in contamination to enhance device yields. The generic VIISta platform covers the range of ion implantation energies from 200eV through to 3.75 MeV. For medium current implants in the middle of that range, the VIISta 810 HP provides control of Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer, the company claimed.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / VARIAN
VIISta 810HP
検証済み
カテゴリ
Medium Current
最終検証： 28日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
115325
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
VIISta 810HP
カテゴリ
Medium Current
最終検証： 28日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
115325
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
MED CURRENT IMPLANTER - HP構成
構成なしOEMモデルの説明
The VIISta 810 HP provides precise total incident angle and dosimetry control to enable tighter distribution of electrical device parameters and a 50% reduction in contamination to enhance device yields. The generic VIISta platform covers the range of ion implantation energies from 200eV through to 3.75 MeV. For medium current implants in the middle of that range, the VIISta 810 HP provides control of Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer, the company claimed.ドキュメント
ドキュメントなし