説明
Automatic CV System for CV/QV/IV measurement構成
構成なしOEMモデルの説明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.ドキュメント
ドキュメントなし
SSM
5200
検証済み
カテゴリ
Metrology
最終検証： 26日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
115106
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SSM
5200
カテゴリ
Metrology
最終検証： 26日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
115106
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Automatic CV System for CV/QV/IV measurement構成
構成なしOEMモデルの説明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.ドキュメント
ドキュメントなし