説明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.構成
構成なしOEMモデルの説明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.ドキュメント
ドキュメントなし
SSM
5200
検証済み
カテゴリ
Metrology
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
17283
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SSM
5200
カテゴリ
Metrology
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
17283
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.構成
構成なしOEMモデルの説明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.ドキュメント
ドキュメントなし