説明
ANALYTICAL EQUIPMENT Process Type: FA SEMs/TEMs/Dual Beams構成
1. Operating system: Win XP 2002, SP3 2. User interface: FEI xT 3.8.10, 10-1-2013 3. SEM SFEG 4. FIB Sidewinder (21nA) 5. GIS Traditional: Traditional: Pt, SCM, IEE and Omni GIS Carbon deposit 6. Detectors ETD, CDM, TLD 7. Additional items: Autoprobe 200, XEI Evactron, ThermoCube chiller 8. Main OEM PC, Support PC (contains Omni GIS software as well as Autoprobe SW)OEMモデルの説明
The Helios NanoLab 400 is a DualBeam system that integrates both ion and electron beams for Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at a short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution. This system provides a powerful tool for sample preparation and analysis.ドキュメント
ドキュメントなし
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
HELIOS NANOLAB 400
検証済み
カテゴリ
Microscope
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
43516
ウェーハサイズ：
不明
ヴィンテージ：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
HELIOS NANOLAB 400
カテゴリ
Microscope
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
43516
ウェーハサイズ：
不明
ヴィンテージ：
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ANALYTICAL EQUIPMENT Process Type: FA SEMs/TEMs/Dual Beams構成
1. Operating system: Win XP 2002, SP3 2. User interface: FEI xT 3.8.10, 10-1-2013 3. SEM SFEG 4. FIB Sidewinder (21nA) 5. GIS Traditional: Traditional: Pt, SCM, IEE and Omni GIS Carbon deposit 6. Detectors ETD, CDM, TLD 7. Additional items: Autoprobe 200, XEI Evactron, ThermoCube chiller 8. Main OEM PC, Support PC (contains Omni GIS software as well as Autoprobe SW)OEMモデルの説明
The Helios NanoLab 400 is a DualBeam system that integrates both ion and electron beams for Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at a short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution. This system provides a powerful tool for sample preparation and analysis.ドキュメント
ドキュメントなし