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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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KLA ARCHER 200
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Archer 200 is an optical overlay control system designed to meet the performance and cost-of-ownership requirements for advanced design rules, including 32nm and double-patterning lithography. It features major improvements to its core optical design and an optional scatterometry measurement technology. This system offers tighter total measurement uncertainty, increased flexibility, higher productivity, and faster measurement. It uses industry-standard AIM or smaller µAIM targets.
    ドキュメント

    ドキュメントなし

    KLA

    ARCHER 200

    verified-listing-icon

    検証済み

    カテゴリ
    Overlay

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Deinstalled / Crated


    製品ID:

    108719


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA ARCHER 200

    KLA

    ARCHER 200

    Overlay
    ヴィンテージ: 0状態: 中古
    最終確認23日前

    KLA

    ARCHER 200

    verified-listing-icon
    検証済み
    カテゴリ
    Overlay
    最終検証: 60日以上前
    listing-photo-1d630c8d1146443daec54822ae9d7bf5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Deinstalled / Crated


    製品ID:

    108719


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The Archer 200 is an optical overlay control system designed to meet the performance and cost-of-ownership requirements for advanced design rules, including 32nm and double-patterning lithography. It features major improvements to its core optical design and an optional scatterometry measurement technology. This system offers tighter total measurement uncertainty, increased flexibility, higher productivity, and faster measurement. It uses industry-standard AIM or smaller µAIM targets.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA ARCHER 200

    KLA

    ARCHER 200

    Overlayヴィンテージ: 0状態: 中古最終検証:23日前
    KLA ARCHER 200

    KLA

    ARCHER 200

    Overlayヴィンテージ: 0状態: 中古最終検証:60日以上前
    KLA ARCHER 200

    KLA

    ARCHER 200

    Overlayヴィンテージ: 0状態: 中古最終検証:60日以上前