KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

The Archer 750 were launched during the fiscal year ended June 30, 2020, which utilizes wavelength tunability to produce accurate overlay measurements. 

ARCHER 750

Overlay registration, 65 wafers per hour (8-inch wafers), 5nm resolution, 7.5nm repeatability.

5011

Archer 10 is an Automated Optical Overlay Metrology product that provides control of overlay error budget for sub-0.13-micron production, increases throughput by 30%, and allows consistent measurement of low-contrast targets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.

ARCHER 10

The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.

ARCHER 300

ARCHER 200 PRO EX

ARCHER 200+

The ATL100 (Accurate Tunable Laser) scatterometry-based overlay metrology systems, introduced in September 2017, utilize tunable laser technology to automatically maintain highly accurate and robust overlay error measurements in the presence of process variations, supporting fast technology ramps and wafer disposition during production.

ATL100

5000

5015XP

The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.

5200

To help achieve sub-3nm overlay error for advanced logic and memory devices KLA introduced the Archer 600 imaging-based overlay metrology system. New optics in combination with innovative ProAIM targets deliver better resilience to process variations and improved correlation between measurement target and actual device pattern overlay errors, producing more accurate overlay measurements.

ARCHER 600

The Archer 500 is a high-performance overlay metrology system for advanced patterning processes. It offers improved precision, measurement speed, and meets strict specifications for overlay error on multi-patterning lithography layers. The Archer 500 utilizes an innovative multi-layer target to provide precise, fast feedback on overlay error. Improvements to the optical subsystems and platform result in better overlay measurement specifications than the previous-generation Archer 300. New illumination options enable overlay measurement capability on a wide range of lithography layers. The Archer 500 is suitable for multi-patterning technologies, in-line monitoring, and scanner qualification. It seamlessly integrates with K-T Analyzer and Recipe Database Manager to improve fab productivity.

ARCHER 500

5100

The KLA-Tencor 5200XP is an automated overlay metrology tool for the semiconductor industry. It improves overlay control, maximizes lithography tool utilization, and meets the requirements of 0.18 µm design rules. It has the highest throughput in the industry and is compatible with current factory automation standards.

5200XP

The Archer 200 is an optical overlay control system designed to meet the performance and cost-of-ownership requirements for advanced design rules, including 32nm and double-patterning lithography. It features major improvements to its core optical design and an optional scatterometry measurement technology. This system offers tighter total measurement uncertainty, increased flexibility, higher productivity, and faster measurement. It uses industry-standard AIM or smaller µAIM targets.

ARCHER 200

The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.

ARCHER AIM+

ARCHER 300+

Archer AIM is an Advanced Optical Overlay Metrology product that improves stepper correction accuracy, provides precise data, and enables design rule segmentation. It delivers industry-leading precision performance, reduces total measurement uncertainty, and increases sampling rate. It also includes offline automatic recipe creation and real-time analysis software. The MPX option enables ‘on product’ monitoring of focus-exposure. Archer AIM targets new standards for lithography process control for 65-nm and beyond, reducing measurement uncertainty and enabling control of overlay error budgets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.

ARCHER AIM

6020

The Archer 100 optical overlay control system is a cost-effective and high-performance solution for advanced design rules and immersion lithography. It has a lower total measurement uncertainty, improved tool utilization, and is extendible to address future lithography challenges. It also features automatic recipe optimization to minimize human error and free up fab resources.

ARCHER 100

50-03000	

ARCHER 700

The Archer 10XT+ is a semiconductor manufacturing tool that features a 300mm wafer. It boasts a long-term precision improvement of 66% compared to its predecessor, the A10. In terms of performance, the Archer 10XT+ has a MAM (Mean Average Measurement) time of 1.35 seconds. It can process 150 wafers per hour (WPH) and 29 lots per hour (LPH) when using a 300mm FOUP (Front Opening Unified Pod).

ARCHER 10 XT+

The 5105 for both overlay and critical dimension measurement.

5105

5300

The Archer 10XT is an Automated Optical Overlay Metrology product that enables control of overlay error budget for sub-90-nm production. It provides a significant increase in throughput, precision, and TIS variability over previous generation systems. The system is user-friendly and has a competitive cost-of-ownership for 300-mm manufacturing at the sub-90-nm node. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

KLA

概要（Overview）

現在の掲載品

全ての製品

サービス

トップKLA Overlay

ARCHER 600

ATL100

5200

ARCHER 10

Moovに掲載品して、すぐに申し分ない購入者を見つけましょう。

すべてのKLA Overlay