説明
Archer 300+ AIM構成
構成なしOEMモデルの説明
The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.ドキュメント
ドキュメントなし
検証済み
カテゴリ
Overlay
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136029
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KLA
ARCHER 300
カテゴリ
Overlay
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136029
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Archer 300+ AIM構成
構成なしOEMモデルの説明
The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.ドキュメント
ドキュメントなし