説明
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”構成
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEMモデルの説明
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
検証済み
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
113547
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
113547
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”構成
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEMモデルの説明
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersドキュメント
ドキュメントなし