
説明
Platform RTP Equipment Producer GT3 Pyra Anneal構成
· Factory Interface o Wafer exchange platform (passive cooldown slots) o 2 stationary robots o Pre-aligner o 2 Load locks o 2 N2 Loadports w/ chrome lift pins o Cool-down station/pass-thru · Mainframe (including loadlock) o 4 cooling station loadlocks (QWLL) with N2 purge o Dual robot o 1 pump for QWLL o Atmospheric pressure operation · Anneals Twin Chamber o Dual zone heaters o Matte shower head o Lift pins o Liners (2/chamber) o 1 pump for 3 twin vacuum chuck · Chamber Gas Panel o 3 gas sticks o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Loadlock cooling capability o Pyrometry system o POU Filters o Additional N2 Load Port o Additional gas stickOEMモデルの説明
The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.ドキュメント
ドキュメントなし
カテゴリ
PECVD
最終検証: 7日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
135068
ウェーハサイズ:
12"/300mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
PRODUCER GT3 APFE
カテゴリ
PECVD
最終検証: 7日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
135068
ウェーハサイズ:
12"/300mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Platform RTP Equipment Producer GT3 Pyra Anneal構成
· Factory Interface o Wafer exchange platform (passive cooldown slots) o 2 stationary robots o Pre-aligner o 2 Load locks o 2 N2 Loadports w/ chrome lift pins o Cool-down station/pass-thru · Mainframe (including loadlock) o 4 cooling station loadlocks (QWLL) with N2 purge o Dual robot o 1 pump for QWLL o Atmospheric pressure operation · Anneals Twin Chamber o Dual zone heaters o Matte shower head o Lift pins o Liners (2/chamber) o 1 pump for 3 twin vacuum chuck · Chamber Gas Panel o 3 gas sticks o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Loadlock cooling capability o Pyrometry system o POU Filters o Additional N2 Load Port o Additional gas stickOEMモデルの説明
The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.ドキュメント
ドキュメントなし