説明
Platform RTP Equipment Producer GT3 Pyra Anneal構成
· Factory Interface o 2 stationary robots o Pre-aligner o 2 N2 loadports o Standard pass-thru · Reduced Pressure Mainframe o 4 cooling station loadlocks (QWLL) with N2 purge o Dual blade robot · Anneals Twin Chamber with In Situ Clean o Dual zone heaters o RPS quartz liners o Chamber quartz liners o Chamber uniformity liners o Shower head o Lift pins o RPS clean (1 RPS per twin chamber) · Chamber Gas Panel o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Water cooled QWLL o Heated exhaust lines o Additional N2 Load Port o Additional gas stick o Mainframe O2 analyzerOEMモデルの説明
The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.ドキュメント
ドキュメントなし
カテゴリ
PECVD
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135055
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
PRODUCER GT3 APFE
カテゴリ
PECVD
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135055
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Platform RTP Equipment Producer GT3 Pyra Anneal構成
· Factory Interface o 2 stationary robots o Pre-aligner o 2 N2 loadports o Standard pass-thru · Reduced Pressure Mainframe o 4 cooling station loadlocks (QWLL) with N2 purge o Dual blade robot · Anneals Twin Chamber with In Situ Clean o Dual zone heaters o RPS quartz liners o Chamber quartz liners o Chamber uniformity liners o Shower head o Lift pins o RPS clean (1 RPS per twin chamber) · Chamber Gas Panel o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Water cooled QWLL o Heated exhaust lines o Additional N2 Load Port o Additional gas stick o Mainframe O2 analyzerOEMモデルの説明
The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.ドキュメント
ドキュメントなし