説明

See photos -Plasma 100 PECVD L/L Main system 1824x771×1413 -Pfeiffer A604H/Dry Pump Pump (Process Chamber) 909x390x839 -Adixen ACP15G dry pump Pump (Load lock chamber) 476x333x396 -Gas Pod (PECVD 8 Gas line) Gas control system 650x220x1030 -Computer System System control

構成

400V50Hz 3phase supply configuration 10m process chamber cable PC &19" monitor Chamber right hand build configuration400C deposition lower electrode kit RF 600W generator & amu match for High-Rate PECVD (AE Dressler) 5T CM gauge kit (Inficon) PlasmaPro 100 Chamber and pump down pipe Heating KitPfeiffer A604H pump kit 10m pump cable Roughing only to Dry Pump - Isolation Valve includedNo Turbo required Adixen ACP15G dry pump kit PlasmaPro 100 compact single wafer loadlock kitStandard Gas Pod externally mounted (8 lines max) Standard gasline and MFC for non-toxic gases By-passed gasline and MFC for toxic gasesSplit gas manifold, 2 points,

OEMモデルの説明

The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate.