メインコンテンツにスキップ
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 続きを読む

Moov logo

Moov Icon
OXFORD PLASMAPRO NGP1000
  • OXFORD PLASMAPRO NGP1000
  • OXFORD PLASMAPRO NGP1000
  • OXFORD PLASMAPRO NGP1000
説明
説明なし
構成
450mm wafer capable, Load-Lock Chamber - Model: Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4500 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 100khz LF RF Generator - Gas-Shock assisted Chamber Lift Mechanism - Adixen ADS602P Dry Pump for Process Chamber - Load Lock vacuum pump - Operations Manual and Documentation
OEMモデルの説明
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.
ドキュメント
カテゴリ
PECVD

最終検証: 60日以上前

主なアイテムの詳細

状態:

Refurbished


稼働ステータス:

不明


製品ID:

83230


ウェーハサイズ:

15"/450mm


ヴィンテージ:

2012


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

OXFORD

PLASMAPRO NGP1000

verified-listing-icon
検証済み
カテゴリ
PECVD
最終検証: 60日以上前
listing-photo-713646ff0c6b4115a172cc671b37a9bc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/713646ff0c6b4115a172cc671b37a9bc/89bab1ec4a5243b7b7c32e54e01a3882_a9079750594149918ce6690b9f9d65d6_mw.png
listing-photo-713646ff0c6b4115a172cc671b37a9bc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/713646ff0c6b4115a172cc671b37a9bc/85d6b32eb5034fc2a1da6cec33c5c7ce_74cea9b902094a59b34c5318782863f31201a_mw.jpeg
listing-photo-713646ff0c6b4115a172cc671b37a9bc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/713646ff0c6b4115a172cc671b37a9bc/5d9decdc0a6748cfb4eec2e4624b4858_9b9a91bcdfaa4ec597ce0975bae8db55_mw.png
主なアイテムの詳細

状態:

Refurbished


稼働ステータス:

不明


製品ID:

83230


ウェーハサイズ:

15"/450mm


ヴィンテージ:

2012


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし
構成
450mm wafer capable, Load-Lock Chamber - Model: Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4500 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 100khz LF RF Generator - Gas-Shock assisted Chamber Lift Mechanism - Adixen ADS602P Dry Pump for Process Chamber - Load Lock vacuum pump - Operations Manual and Documentation
OEMモデルの説明
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.
ドキュメント