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PLASMATHERM LAPECVD
  • PLASMATHERM LAPECVD
  • PLASMATHERM LAPECVD
  • PLASMATHERM LAPECVD
説明
Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White) -Actual Status of Equipment/Parts -Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement. -Transfer robot is broken. -Load Lock module initialization fails. -System software failure. Chiller: Requires repair. Anti-Static Device: Functional. Disposition or Usable Parts For Sale: Main equipment, chiller, anti-static device, monitor shelf. Exclusions from Sale: Pump, monitor, keyboard, chair.
構成
構成なし
OEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
ドキュメント

ドキュメントなし

verified-listing-icon

検証済み

カテゴリ
PECVD

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

117210


ウェーハサイズ:

8"/200mm


ヴィンテージ:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

PLASMATHERM

LAPECVD

verified-listing-icon
検証済み
カテゴリ
PECVD
最終検証: 60日以上前
listing-photo-281aaaca46df44acaa692fa73a2b06b6-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

117210


ウェーハサイズ:

8"/200mm


ヴィンテージ:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White) -Actual Status of Equipment/Parts -Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement. -Transfer robot is broken. -Load Lock module initialization fails. -System software failure. Chiller: Requires repair. Anti-Static Device: Functional. Disposition or Usable Parts For Sale: Main equipment, chiller, anti-static device, monitor shelf. Exclusions from Sale: Pump, monitor, keyboard, chair.
構成
構成なし
OEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
ドキュメント

ドキュメントなし