説明
Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White) -Actual Status of Equipment/Parts -Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement. -Transfer robot is broken. -Load Lock module initialization fails. -System software failure. Chiller: Requires repair. Anti-Static Device: Functional. Disposition or Usable Parts For Sale: Main equipment, chiller, anti-static device, monitor shelf. Exclusions from Sale: Pump, monitor, keyboard, chair.構成
構成なしOEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower headドキュメント
ドキュメントなし
PLASMATHERM
LAPECVD
検証済み
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117210
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PLASMATHERM
LAPECVD
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117210
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White) -Actual Status of Equipment/Parts -Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement. -Transfer robot is broken. -Load Lock module initialization fails. -System software failure. Chiller: Requires repair. Anti-Static Device: Functional. Disposition or Usable Parts For Sale: Main equipment, chiller, anti-static device, monitor shelf. Exclusions from Sale: Pump, monitor, keyboard, chair.構成
構成なしOEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower headドキュメント
ドキュメントなし