説明
説明なし構成
Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBSOEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower headドキュメント
ドキュメントなし
PLASMATHERM
LAPECVD
検証済み
カテゴリ
PECVD
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
62674
ウェーハサイズ:
不明
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PLASMATHERM
LAPECVD
カテゴリ
PECVD
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
62674
ウェーハサイズ:
不明
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBSOEMモデルの説明
Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower headドキュメント
ドキュメントなし