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PLASMATHERM LAPECVD
    説明
    説明なし
    構成
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEMモデルの説明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    ドキュメント

    ドキュメントなし

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    検証済み

    カテゴリ
    PECVD

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    62674


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    ヴィンテージ: 2009状態: 中古
    最終確認60日以上前

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    検証済み
    カテゴリ
    PECVD
    最終検証: 60日以上前
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/03565e4565c04ae3bc771bfc463d71ea_499b92a1f4794b9295d6f0d0ad0e7a801201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/b7eae78bf9c7426187975267f4c7688b_91d0dd3b47b1450ab04b57daaafc81d31201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/404626f9c5e345e6b21e4eea73fe728e_8e67d42f4dc04b6e9c67dc9a2a4f84481201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/7f541f28bad841c49eda37d1fcf34eb7_b405d58decde4e5aa78145daee99f2151201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/c768eefbace94ec5bb80a8cba8082065_b7ed8ec56c2041ea839d952c42907e721201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/3f7e2507ca4b4e7cb678fd76fd0b861b_fec7e08042914eebb43a4e76bae403321201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/7bdd771c403b4126af67297130dd4c31_0dcd9729c8a74ceb83063769afabeecd1201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    62674


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEMモデルの説明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDヴィンテージ: 2009状態: 中古最終検証:60日以上前
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDヴィンテージ: 2006状態: 中古最終検証:8日前