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PLASMATHERM LAPECVD
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    ドキュメント

    ドキュメントなし

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    検証済み

    カテゴリ
    PECVD

    最終検証: 15日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    114751


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    ヴィンテージ: 2009状態: 中古
    最終確認60日以上前

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    検証済み
    カテゴリ
    PECVD
    最終検証: 15日前
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76241/7a6787c3d8ad406889461cc466aaf415/de11985e48884a288dc80de63ece79c8_c9a90fb97fcb4aa6bac469cc08821cc31201a_mw.jpeg
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76241/7a6787c3d8ad406889461cc466aaf415/f317b23b62fd4dc3840b2e287bd70098_44a119104d104acf9f0f7d1d485d27af1201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    114751


    ウェーハサイズ:

    不明


    ヴィンテージ:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDヴィンテージ: 2009状態: 中古最終検証:60日以上前
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDヴィンテージ: 2006状態: 中古最終検証:15日前
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDヴィンテージ: 0状態: 中古最終検証:2日前