説明
Asset Description chamber 3 AMAT ENDURA2 SILICIDE STD NICKEL_CH Software Version: 2.8 CIM: SECS Process: NI構成
Hardware Configuration System Type Description Quantity Main System Endura II 0 Factory Interface FOUP Others n/a Handler System n/a Options System n/a Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136338
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
ENDURA II
カテゴリ
PVD / Sputtering
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136338
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Asset Description chamber 3 AMAT ENDURA2 SILICIDE STD NICKEL_CH Software Version: 2.8 CIM: SECS Process: NI構成
Hardware Configuration System Type Description Quantity Main System Endura II 0 Factory Interface FOUP Others n/a Handler System n/a Options System n/a Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし