説明
説明なし構成
<p>Tool is operating in clean room.</p><p> </p><p>[Chamber 1]</p><p>For Ti/TiN PVD chamber,SIP</p><p>DCPS;Master,PINNACLE,AE,for PVD</p><p> Slave,PINNACLE,AE,for PVD</p><p>RFPS;GHW-12,ENI,for Bias </p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;50/20sccm, N2;200sccm</p><p> </p><p>[Chamber 2]</p><p>For Al-Cu PVD chamber,ALPS</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;100/20sccm</p><p> </p><p>[Chamber 3]</p><p>For Al-Cu PVD chamber</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>HT ESC type stage</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber 4]</p><p>For Al-Cu PVD chamber</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>HT ESC type stage</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber 5]</p><p>For Ti/TiN PVD chamber,SIP</p><p>DCPS;Master,PINNACLE,AE,for PVD</p><p> Slave,PINNACLE,AE,for PVD</p><p>RFPS;GHW-12,ENI,for Bias </p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;50/20sccm, N2;200sccm</p><p> </p><p>[Chamber C]</p><p>For Pre-CLN chamber,PCXT</p><p>RFPS;CDX-2000,13.56/2MHz,COMDEL,for BIAS/SLA</p><p>PUMP/TMP MAG1300,LEYBOLD.</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber D]</p><p>For TiN PVD chamber</p><p>DCPS;OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>A101 type stage</p><p>Ar/N2;150/200sccm</p><p> </p><p>[Chamber E]</p><p>For Degas,Plate heater</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>Ar,press. Controlled</p><p> </p><p>[Chamber E]</p><p>For Degas,Plate heater</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>Ar,press. Controlled</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>OEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
21098
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
ENDURA II
カテゴリ
PVD / Sputtering
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
21098
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
<p>Tool is operating in clean room.</p><p> </p><p>[Chamber 1]</p><p>For Ti/TiN PVD chamber,SIP</p><p>DCPS;Master,PINNACLE,AE,for PVD</p><p> Slave,PINNACLE,AE,for PVD</p><p>RFPS;GHW-12,ENI,for Bias </p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;50/20sccm, N2;200sccm</p><p> </p><p>[Chamber 2]</p><p>For Al-Cu PVD chamber,ALPS</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;100/20sccm</p><p> </p><p>[Chamber 3]</p><p>For Al-Cu PVD chamber</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>HT ESC type stage</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber 4]</p><p>For Al-Cu PVD chamber</p><p>DCPS;Master,OPTIMA DCG-200,ENI,for PVD</p><p> Slave,OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>HT ESC type stage</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber 5]</p><p>For Ti/TiN PVD chamber,SIP</p><p>DCPS;Master,PINNACLE,AE,for PVD</p><p> Slave,PINNACLE,AE,for PVD</p><p>RFPS;GHW-12,ENI,for Bias </p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>SLT ESC type stage</p><p>Ar;50/20sccm, N2;200sccm</p><p> </p><p>[Chamber C]</p><p>For Pre-CLN chamber,PCXT</p><p>RFPS;CDX-2000,13.56/2MHz,COMDEL,for BIAS/SLA</p><p>PUMP/TMP MAG1300,LEYBOLD.</p><p>Ar;200/20sccm</p><p> </p><p>[Chamber D]</p><p>For TiN PVD chamber</p><p>DCPS;OPTIMA DCG-200,ENI,for PVD</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>A101 type stage</p><p>Ar/N2;150/200sccm</p><p> </p><p>[Chamber E]</p><p>For Degas,Plate heater</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>Ar,press. Controlled</p><p> </p><p>[Chamber E]</p><p>For Degas,Plate heater</p><p>PUMP/CRYO,SICERA KZ-8Ｌ3Ｃ,SHI</p><p>Ar,press. Controlled</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>OEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし