説明
Defect Detection構成
Software Version: 4.2.24 Process: Reticle InspectionOEMモデルの説明
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.ドキュメント
ドキュメントなし
KLA
SL301
カテゴリ
Reticle / Mask Inspection
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
153866
ウェーハサイズ：
12"/300mm
ヴィンテージ：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Defect Detection構成
Software Version: 4.2.24 Process: Reticle InspectionOEMモデルの説明
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.ドキュメント
ドキュメントなし