説明
450mm wafer capable, Load-Lock Chamber構成
Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 2Mhz LF RF Generator - Pneumatic Chamber Lift Kit - Adixen ADS602P Dry Pump for Process Chamber - Adixen ACP40G for Load Lock - Operations Manual and Documentation X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: - He - CF4 - N2 - N20 - NH3 - SiH4-N2OEMモデルの説明
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.ドキュメント
ドキュメントなし
OXFORD
PLASMAPRO NGP1000
検証済み
カテゴリ
PECVD
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
77527
ウェーハサイズ：
15"/450mm
ヴィンテージ：
2012
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO NGP1000
検証済み
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
77527
ウェーハサイズ：
15"/450mm
ヴィンテージ：
2012
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
450mm wafer capable, Load-Lock Chamber構成
Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 2Mhz LF RF Generator - Pneumatic Chamber Lift Kit - Adixen ADS602P Dry Pump for Process Chamber - Adixen ACP40G for Load Lock - Operations Manual and Documentation X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: - He - CF4 - N2 - N20 - NH3 - SiH4-N2OEMモデルの説明
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.ドキュメント
ドキュメントなし