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説明
FEI FIB 800 Focused Ion Beam (FIB) System Does not include GIS Missing molecular pump And the controller.構成
Configuration: ISA Interface Joystick Oil pump Hard Disk Drive (HDD) I-Gun: Type: Prelens column Beam current: 1 pA - 11 nA Vacuum types: Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: MS Windows NTOEMモデルの説明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.ドキュメント
ドキュメントなし
カテゴリ
SEM / FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
106614
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
カテゴリ
SEM / FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
106614
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
FEI FIB 800 Focused Ion Beam (FIB) System Does not include GIS Missing molecular pump And the controller.構成
Configuration: ISA Interface Joystick Oil pump Hard Disk Drive (HDD) I-Gun: Type: Prelens column Beam current: 1 pA - 11 nA Vacuum types: Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: MS Windows NTOEMモデルの説明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.ドキュメント
ドキュメントなし