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ASML PAS 5500/1100B

説明

Function: Exposure machine Structure: Modular CD 0.11

構成

構成なし

OEMモデルの説明

This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.

ドキュメント

ドキュメントなし

ASML

PAS 5500/1100B

verified-listing-icon

検証済み

カテゴリ

Steppers & Scanners

最終検証： 60日以上前

主なアイテムの詳細

状態：

Used

稼働ステータス:

不明

製品ID：

123817

ウェーハサイズ：

不明

ヴィンテージ：

2001

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

同様のリスト

すべて表示

ASML PAS 5500/1100B

ASML

PAS 5500/1100B

Steppers & Scanners

ヴィンテージ： 2001状態：中古

最終確認60日以上前

ASML

PAS 5500/1100B

verified-listing-icon

検証済み

カテゴリ

Steppers & Scanners

最終検証： 60日以上前

listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/c89aa81f3fed4d84b145f2340c3dfa79_3_mw.jpg

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主なアイテムの詳細

状態：

Used

稼働ステータス:

不明

製品ID：

123817

ウェーハサイズ：

不明

ヴィンテージ：

2001

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

説明

Function: Exposure machine Structure: Modular CD 0.11

構成

構成なし

OEMモデルの説明

This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.

ドキュメント

ドキュメントなし

同様のリスト

すべて表示

ASML PAS 5500/1100B

ASML

PAS 5500/1100B

Steppers & Scannersヴィンテージ： 2001状態：中古最終検証：60日以上前