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説明
Function: Exposure machine Structure: Modular CD 0.11構成
構成なしOEMモデルの説明
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
123817
ウェーハサイズ：
不明
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/1100B
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
123817
ウェーハサイズ：
不明
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Function: Exposure machine Structure: Modular CD 0.11構成
構成なしOEMモデルの説明
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.ドキュメント
ドキュメントなし