説明
説明なし構成
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEMモデルの説明
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
138151
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1060K
カテゴリ
Steppers & Scanners
最終検証： 今日
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
138151
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEMモデルの説明
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.ドキュメント
ドキュメントなし