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6" Fab For Sale from Moov - Click Here to Learn More
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ASML TWINSCAN XT:1400F
    説明
    ARF-D SCANNER
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
    ドキュメント

    ドキュメントなし

    ASML

    TWINSCAN XT:1400F

    verified-listing-icon

    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    107708


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scanners
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    ASML

    TWINSCAN XT:1400F

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 60日以上前
    listing-photo-829fc433cf8b43b7bcebe21dfeae0cab-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    107708


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    ARF-D SCANNER
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:60日以上前
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:60日以上前