説明
193nm (ArF) Scanner構成
構成なしOEMモデルの説明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135426
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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すべて表示
ASML
TWINSCAN XT:1400F
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135426
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
193nm (ArF) Scanner構成
構成なしOEMモデルの説明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.ドキュメント
ドキュメントなし