説明
Main Process: Photo Sub-Process: ARF Scanner構成
S/W version: 5.1.0 Laser Type: cyber XLA 360 Laser Remaining Lifetime: 90.5% Lens Type: 1700i NA: 1.2 Lens Data (EMZQ): Current [nm] Spherical: 0.52 Coma: 0.59 Astigmatism: 0.57 3-foil: 0.57 (25->Z37): 1.29 Focus Range (Chuck 1/2) 22/31 Details AttachedOEMモデルの説明
The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.ドキュメント
カテゴリ
Steppers & Scanners
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
145985
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASML
TWINSCAN XT:1700Fi
カテゴリ
Steppers & Scanners
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
145985
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available