
説明
説明なし構成
Function: Stepper lithography machine Structure: I-line 365nm Parameter specifications: CD 0.35um~0.45um, MMO overlay 0.08um, field size 22 x 22OEMモデルの説明
The NSR-2205i11C is equipped with a resolution of 450nm or better and features a numerical aperture (NA) of 0.57. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system comes with the LSA alignment system as standard and offers the optional FIA and LIA alignment systems.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
131254
ウェーハサイズ:
8"/200mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示NIKON
NSR-2205i11C
カテゴリ
Steppers & Scanners
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
131254
ウェーハサイズ:
8"/200mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Function: Stepper lithography machine Structure: I-line 365nm Parameter specifications: CD 0.35um~0.45um, MMO overlay 0.08um, field size 22 x 22OEMモデルの説明
The NSR-2205i11C is equipped with a resolution of 450nm or better and features a numerical aperture (NA) of 0.57. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system comes with the LSA alignment system as standard and offers the optional FIA and LIA alignment systems.ドキュメント
ドキュメントなし