説明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.構成
0.35 0.63 5:1 22*22 FIA:70OEMモデルの説明
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
131658
ウェーハサイズ：
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NIKON
NSR-2205i12D
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
131658
ウェーハサイズ：
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.構成
0.35 0.63 5:1 22*22 FIA:70OEMモデルの説明
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.ドキュメント
ドキュメントなし