説明
- Model: Mark 40C - Process Chamber Dimensions: 26” x 26” - CHA SR-10 E-Beam Power Supply (10kW) - CHA T271-4-1 Electron Beam Source - Crucible: 4 pockets, 15cc each - CHA Beam Sweep Controller - CHA Auto Tech-2 Pump Cycle Controller - Blade Position Controller - Fixture Control and Shutter Controller - E.B. Gun Rotation Controller - RGA Valve Control - Substrate Heat - 10kW Heater Power Supply (CHA HPS-671-10) - Sycon STC-200/SQ Deposition Rate Controller - Granville Philips 307 Vacuum Gauge Control - MKS Type 250 Pressure/Flow Controller - Neslab CFT-150 Chillers, Qty 2 - CTI-Cryogenics 8500 Compressor - Edwards E2M40 2-Stage Vacuum Pump - Liquid Nitrogen Level Control構成
6 Pocket E-Gun Inficon CI-100 Ebeam Pocket Control Indexer Ti, Ni, Au, Pd/Pt, Al/Ge, Cu/CrOEMモデルの説明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.ドキュメント
ドキュメントなし
CHA
MARK 40
検証済み
カテゴリ
Thermal Evaporators
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
81698
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CHA
MARK 40
カテゴリ
Thermal Evaporators
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
81698
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
- Model: Mark 40C - Process Chamber Dimensions: 26” x 26” - CHA SR-10 E-Beam Power Supply (10kW) - CHA T271-4-1 Electron Beam Source - Crucible: 4 pockets, 15cc each - CHA Beam Sweep Controller - CHA Auto Tech-2 Pump Cycle Controller - Blade Position Controller - Fixture Control and Shutter Controller - E.B. Gun Rotation Controller - RGA Valve Control - Substrate Heat - 10kW Heater Power Supply (CHA HPS-671-10) - Sycon STC-200/SQ Deposition Rate Controller - Granville Philips 307 Vacuum Gauge Control - MKS Type 250 Pressure/Flow Controller - Neslab CFT-150 Chillers, Qty 2 - CTI-Cryogenics 8500 Compressor - Edwards E2M40 2-Stage Vacuum Pump - Liquid Nitrogen Level Control構成
6 Pocket E-Gun Inficon CI-100 Ebeam Pocket Control Indexer Ti, Ni, Au, Pd/Pt, Al/Ge, Cu/CrOEMモデルの説明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.ドキュメント
ドキュメントなし