説明
Structure: Vapor deposition chamber, radical chamber, sputtering chamber Turbo molecular pump TMP-303LM <Vapor deposition chamber> Organic resistance heating x 10 points, metal zone x 4 points, resistance heating evaporation sources 2 boats/1 set, exhaust CRYO-U, Film controller CRTM-9000 (5 types for sensor organics, 2 types for metals), 2 constant current power supplies, high current power <radical chamber> O2 gas, RF200W <sputtering chamber> ITO sputtering, DC2kW, substrate heating possible, turbo molecule Pump TMP-803L G Box: VAC Model: VAC102282-OMNI-LAB 3φ200V 50/60Hz Approx. 59.4kVA構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし
ULVAC
Mini-Lab
検証済み
カテゴリ
Thermal Evaporators
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
70795
ウェーハサイズ:
不明
ヴィンテージ:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
Mini-Lab
カテゴリ
Thermal Evaporators
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
70795
ウェーハサイズ:
不明
ヴィンテージ:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Structure: Vapor deposition chamber, radical chamber, sputtering chamber Turbo molecular pump TMP-303LM <Vapor deposition chamber> Organic resistance heating x 10 points, metal zone x 4 points, resistance heating evaporation sources 2 boats/1 set, exhaust CRYO-U, Film controller CRTM-9000 (5 types for sensor organics, 2 types for metals), 2 constant current power supplies, high current power <radical chamber> O2 gas, RF200W <sputtering chamber> ITO sputtering, DC2kW, substrate heating possible, turbo molecule Pump TMP-803L G Box: VAC Model: VAC102282-OMNI-LAB 3φ200V 50/60Hz Approx. 59.4kVA構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし