説明
good working condition, can demonstrate構成
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEMモデルの説明
提供なしドキュメント
ドキュメントなし
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
検証済み
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66396
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66396
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
good working condition, can demonstrate構成
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEMモデルの説明
提供なしドキュメント
ドキュメントなし