説明
説明なし構成
Process: Nitride Etch CHCL CHF(BOE) EDR H3PO4 H3PO4 H/C QDR SC-1 QDR LPDOEMモデルの説明
The WS-820L Wet Station is a cassetteless wafer cleaning system for 8-inch wafers. It can be custom-configured to meet your precise needs simply by combining compactly designed interface, processing, drying and transfer modules. The WS-820L is further distinguished by its high-tolerance processing, stability, and ease of operation and maintenance. It sets new benchmarks for productivity and advances the overall rationalization of the wafer rinsing process.ドキュメント
ドキュメントなし
SCREEN / DNS / DAINIPPON SCREEN
WS-820L
検証済み
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
36803
ウェーハサイズ：
不明
ヴィンテージ：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SCREEN / DNS / DAINIPPON SCREEN
WS-820L
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
36803
ウェーハサイズ：
不明
ヴィンテージ：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Process: Nitride Etch CHCL CHF(BOE) EDR H3PO4 H3PO4 H/C QDR SC-1 QDR LPDOEMモデルの説明
The WS-820L Wet Station is a cassetteless wafer cleaning system for 8-inch wafers. It can be custom-configured to meet your precise needs simply by combining compactly designed interface, processing, drying and transfer modules. The WS-820L is further distinguished by its high-tolerance processing, stability, and ease of operation and maintenance. It sets new benchmarks for productivity and advances the overall rationalization of the wafer rinsing process.ドキュメント
ドキュメントなし