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説明
POST CMP CLEANING SYSTEM構成
WETOEMモデルの説明
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.ドキュメント
ドキュメントなし
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
検証済み
カテゴリ
Wet Benches - Auto
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
45998
ウェーハサイズ:
8"/200mm
ヴィンテージ:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示SCREEN / DNS / DAINIPPON SCREEN
AS-2000
カテゴリ
Wet Benches - Auto
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
45998
ウェーハサイズ:
8"/200mm
ヴィンテージ:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
POST CMP CLEANING SYSTEM構成
WETOEMモデルの説明
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.ドキュメント
ドキュメントなし