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説明
POST CMP CLEANING SYSTEM構成
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEMモデルの説明
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.ドキュメント
ドキュメントなし
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
93099
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SCREEN / DNS / DAINIPPON SCREEN
AS-2000
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
93099
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
POST CMP CLEANING SYSTEM構成
Dual brush and top side brush chambers, spin dry Post CMP ScrubberOEMモデルの説明
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.ドキュメント
ドキュメントなし