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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
説明
RESIST CLEAN, CU
構成
構成なし
OEMモデルの説明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
ドキュメント

ドキュメントなし

カテゴリ
Ashers / Plasma Cleaner

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

101694


ウェーハサイズ:

不明


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2130

verified-listing-icon
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証: 60日以上前
listing-photo-699fb9c53928425188008031f1e722e0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

101694


ウェーハサイズ:

不明


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
RESIST CLEAN, CU
構成
構成なし
OEMモデルの説明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
ドキュメント

ドキュメントなし