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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
説明
説明なし
構成
Product: GAMMA 2130 Condition: Used Process : PR Strip System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) Process Chamber Configuration: Express type (upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometor: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
OEMモデルの説明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
ドキュメント

ドキュメントなし

カテゴリ
Ashers / Plasma Cleaner

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

74214


ウェーハサイズ:

12"/300mm


ヴィンテージ:

2004


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2130

verified-listing-icon
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証: 60日以上前
listing-photo-dc838bc98f8a403ab59ac19526c0e361-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

74214


ウェーハサイズ:

12"/300mm


ヴィンテージ:

2004


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし
構成
Product: GAMMA 2130 Condition: Used Process : PR Strip System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) Process Chamber Configuration: Express type (upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometor: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4
OEMモデルの説明
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
ドキュメント

ドキュメントなし