説明
CDR E System One Stripper構成
構成なしOEMモデルの説明
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).ドキュメント
ドキュメントなし
MATRIX
105
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
104981
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATRIX
105
カテゴリ
Ashers / Plasma Cleaner
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
104981
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
CDR E System One Stripper構成
構成なしOEMモデルの説明
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).ドキュメント
ドキュメントなし