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説明
Semi Automatic, with Manual loading構成
Wafer diameter: . up to 8 inch (with proper chucks and pre-aligner) . used up to 6 inchOEMモデルの説明
EVG 101 Advanced Resist Processing System The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured wafers for interconnection techniques with EVG’s advanced OmniSpray coating technology. This ensures low material consumption of precious high-viscosity photoresists or polymers while improving uniformity and resist spreading options.ドキュメント
ドキュメントなし
PREFERRED
SELLER
カテゴリ
Coaters & Developers
最終検証： 60日以上前
Buyer pays 12% premium of final sale price
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
108869
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
PREFERRED
SELLER
EVGroup (EVG)
EVG101
カテゴリ
Coaters & Developers
最終検証： 60日以上前
Buyer pays 12% premium of final sale price
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
108869
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Semi Automatic, with Manual loading構成
Wafer diameter: . up to 8 inch (with proper chucks and pre-aligner) . used up to 6 inchOEMモデルの説明
EVG 101 Advanced Resist Processing System The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured wafers for interconnection techniques with EVG’s advanced OmniSpray coating technology. This ensures low material consumption of precious high-viscosity photoresists or polymers while improving uniformity and resist spreading options.ドキュメント
ドキュメントなし