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KLA AIT I
    説明
    説明なし
    構成
    Network Card PCB
    OEMモデルの説明
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    ドキュメント

    ドキュメントなし

    KLA

    AIT I

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    検証済み

    カテゴリ

    Defect Inspection
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    56610


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

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    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA AIT I
    KLAAIT IDefect Inspection
    ヴィンテージ: 1999状態: 中古
    最終確認30日以上前

    KLA

    AIT I

    verified-listing-icon

    検証済み

    カテゴリ

    Defect Inspection
    最終検証: 60日以上前
    listing-photo-688cd814de8d493eb60b5a1c4fdcdf50-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    56610


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Network Card PCB
    OEMモデルの説明
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA AIT I
    KLA
    AIT I
    Defect Inspectionヴィンテージ: 1999状態: 中古最終検証: 30日以上前
    KLA AIT I
    KLA
    AIT I
    Defect Inspectionヴィンテージ: 0状態: 中古最終検証: 60日以上前
    KLA AIT I
    KLA
    AIT I
    Defect Inspectionヴィンテージ: 0状態: 部品ツール最終検証: 60日以上前