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KLA AIT II
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    ドキュメント

    ドキュメントなし

    KLA

    AIT II

    verified-listing-icon

    検証済み

    カテゴリ
    Defect Inspection

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    87796


    ウェーハサイズ:

    8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    KLA AIT II

    KLA

    AIT II

    Defect Inspection
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    KLA

    AIT II

    verified-listing-icon
    検証済み
    カテゴリ
    Defect Inspection
    最終検証: 60日以上前
    listing-photo-ca3c3e57ebab4b3eb49fc7d03fb0c963-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    87796


    ウェーハサイズ:

    8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The AIT II is a patterned wafer inspection system for 150 to 300 mm wafers that provides fast, accurate feedback on process tool performance. It offers an integrated solution for automated defect classification and analysis, quickly turning defect data into yield-enhancing information. It is designed for flexibility in films, etch, photo, and CMP applications and offers advantages such as reducing process excursions, increasing overall equipment effectiveness, improving yield stability/predictability, and augmenting line monitoring.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA AIT II

    KLA

    AIT II

    Defect Inspectionヴィンテージ: 0状態: 中古最終検証:60日以上前
    KLA AIT II

    KLA

    AIT II

    Defect Inspectionヴィンテージ: 2000状態: 中古最終検証:60日以上前
    KLA AIT II

    KLA

    AIT II

    Defect Inspectionヴィンテージ: 0状態: 部品ツール最終検証:10日前