説明
-Dimensions: 80cm * 85cm * 188cm -Weight: 330kg構成
-Non-patterned surface inspection system -0.12 micron defect sensitivity @ 95% capture, based on PSL Standards -0.02 ppm haze sensitivity -Wavelength 488 nm, 30mw Ar laser, blue laser, spot size 90μ -Scan frequency 170 Hz; scan pitch: 10, 20 and 40μ -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM writer, software version: 4.2 -XY coordinates, GEM SECS: options availableOEMモデルの説明
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.ドキュメント
ドキュメントなし
KLA
SURFSCAN 6420
検証済み
カテゴリ
Defect Inspection
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113988
ウェーハサイズ：
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KLA
SURFSCAN 6420
カテゴリ
Defect Inspection
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113988
ウェーハサイズ：
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
-Dimensions: 80cm * 85cm * 188cm -Weight: 330kg構成
-Non-patterned surface inspection system -0.12 micron defect sensitivity @ 95% capture, based on PSL Standards -0.02 ppm haze sensitivity -Wavelength 488 nm, 30mw Ar laser, blue laser, spot size 90μ -Scan frequency 170 Hz; scan pitch: 10, 20 and 40μ -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM writer, software version: 4.2 -XY coordinates, GEM SECS: options availableOEMモデルの説明
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.ドキュメント
ドキュメントなし