説明
説明なし構成
30mw Argon Ion Laser, Vacuum Handling, currently configured for 2 x 200mm open-station Optional: 2 x 300mm Isoport with Asyst robot 2 x 200mm Open Station Tool software options: Oblique, GEMSECS Comport, HSMS, XY.OEMモデルの説明
The SP1 is an unpatterned surface inspection system that can be configured with KLA-Tencor’s Triple-Beam Illumination™ (TBI) technology for exceptional sensitivity on rough films. This technology adds an oblique illumination beam to the SP1’s standard optical configuration, enhancing its ability to capture and distinguish all variations of pits, including crystal originated pits (COPs), from particles. The TBI option maintains the SP1’s axi-symmetric design and allows the use of Adaptive Collection Optics for superior capture of defects on different substrate surfaces.ドキュメント
ドキュメントなし
KLA
SP1-TBI
検証済み
カテゴリ
Defect Inspection
主なアイテムの詳細
状態:
Refurbished
稼働ステータス:
不明
製品ID:
74450
ウェーハサイズ:
不明
ヴィンテージ:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示KLA
SP1-TBI
検証済み
カテゴリ
Defect Inspection
最終検証: 60日以上前
主なアイテムの詳細
状態:
Refurbished
稼働ステータス:
不明
製品ID:
74450
ウェーハサイズ:
不明
ヴィンテージ:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
30mw Argon Ion Laser, Vacuum Handling, currently configured for 2 x 200mm open-station Optional: 2 x 300mm Isoport with Asyst robot 2 x 200mm Open Station Tool software options: Oblique, GEMSECS Comport, HSMS, XY.OEMモデルの説明
The SP1 is an unpatterned surface inspection system that can be configured with KLA-Tencor’s Triple-Beam Illumination™ (TBI) technology for exceptional sensitivity on rough films. This technology adds an oblique illumination beam to the SP1’s standard optical configuration, enhancing its ability to capture and distinguish all variations of pits, including crystal originated pits (COPs), from particles. The TBI option maintains the SP1’s axi-symmetric design and allows the use of Adaptive Collection Optics for superior capture of defects on different substrate surfaces.ドキュメント
ドキュメントなし