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STS HRM
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    ドキュメント

    ドキュメントなし

    STS

    HRM

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    84050


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    STS HRM

    STS

    HRM

    Dry / Plasma Etch
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    STS

    HRM

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/6582f22cec8d4f969ba3e18ca306b0af_e056e7cfffb64bd3a8c045aa83e411801201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/52ad8b07b3a7436d992848b184b9f7ea_ae668dacb01745ffb706bfd85b8584311201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/d139c40858f44905b443ea9b913fe0c6_1d2f91b8c32b4be28d82ae55b031256d1201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/399310ee61464650b345c8d3f9fa781b_1065b7b614c54ccf95889f28f00c44951201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/7438f8d46c1c4cc488acc5d21802777d_2091c0dd1d55410bb116d963bac71df11201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/35f7861b1c96404ba0ebf29bc514ef83_8004ee1cf69a44de9377553dfc550b031201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/8e6687bed67a4368915c44c288887c68_f92dc8e4adba4ce89c816dbf70fc424d1201a_mw.jpeg
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/56916c84e90a46668786aba79a94fa2c_1a387f6ff23142a5ab07bc03f2654e7a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    84050


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    STS HRM

    STS

    HRM

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:60日以上前
    STS HRM

    STS

    HRM

    Dry / Plasma Etchヴィンテージ: 2003状態: 中古最終検証:60日以上前