説明
説明なし構成
AMAT HTF ATM EPI Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID SystemOEMモデルの説明
The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.ドキュメント
APPLIED MATERIALS (AMAT)
CENTURA EPI
検証済み
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111621
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA EPI
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111621
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available