説明

説明なし

構成

AMAT HTF ATM EPI Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID System

OEMモデルの説明

The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.